Recently, Europa-based research hub for advanced semiconductor, imec, has developed forksheet devices that push the limits of nanosheet architecture. Etching processes in these complex 3D structures is a critical step for which manufacturers need accurate and sensitive analytical tools.
Watch the video to see how the AKONIS SIMS tool accurately measures elemental concentrations for different etching rates, outperforming other analytical systems for sensitivity. The unique detection system of the AKONIS SIMS, combined with a novel ion source embedded in an ultra low-energy primary column delivers excellent depth resolution with very high dynamic range.
We show that AKONIS is able to determine the percentage of remaining germanium even for the most etched sample, down to 5%. The AKONIS software automatically centers the primary ion beam in small pads, even at low impact energy, enabling easy patterned wafer monitoring in a High-Volume Manufacturing environment.