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SIMS

AKONIS

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用于半导体晶圆厂中成分测量的全自动 SIMS

AKONIS SIMS 工具通过直接在半导体生产线中提供对注入分布、成分分析和界面数据的高产量、高精度检测，填补了半导体制造工艺中的重要空白。AKONIS 有非常高的自动化水平，确保了各种工具在晶圆厂工艺控制和工具之间匹配方面的可重复性。

AKONIS：SIMS 为晶圆厂带去了卓越品质！ +

除传统的通过表征实验室为半导体行业提供支持的IMS Wf/SC Ultra和 SIMS 4550（四极杆 SIMS）系列外，AKONIS作为其补充，可实现仪器设置和采集例程的完全自动化，从而可在分析灵敏度不受影响的情况下实现快速的厂内分析。AKONIS 受益于极低冲击能量（EXLIE）离子色谱柱技术（< 150 eV）的最新发展，与带高分辨率平台的整片晶圆处理系统相结合，可在最小 20 μm 的压焊点上进行测量。

推动实现 N5 及后继制程的高产量

SiGe 和 SiP 多层堆叠的高分辨率成分和快速掺杂物深度剖析
无与伦比的最小 20 μm 在压焊点上的检测限
将数据反馈到生产线的时间缩短了 97% 以上
光片和图案化的整片晶圆测量
图案识别引擎与高分辨率干涉测量平台相结合，可实现 < 2 μm 的位置精度
基于独特材料数据库的直观recipe创建
SEMI 认证（S2/S8、E4、E5、E39、E84...）
低购置成本

View Webinars +
- Dynamic SIMS for Semiconductors
  
  星期四, 九月 16, 2021
  
  A review of a broad array of IC applications with Dynamic SIMS, from deep to ultra-shallow implant depth profiling in Si-based semiconductors to compositional analysis of thin multilayers in patterned wafer pads, optoelectronics, 2D and non-planar 3D structures. Speaker: Pawel Michałowski, expert-user of CAMECA SC Ultra SIMS at Łukasiewicz Research Network – Institute of Microelectronics and Photonics, Poland
  ↓ Duration : 20 minutes

文档和白皮书 +
- 小册子 - AKONIS
- 应用 - 受限 SiGe 器件的成分测量
- Application - Compositional Measurement of Thin Multilayers in Patterned Wafer Pads
- 应用 - Statistical Process Control of p-mos Logic: B:SiGe Monitoring
- 应用 - SiP Shallow Implant Metrology for n-mos Logic Production
- 应用 - Arsenic Shallow Implant Monitoring
- 为大批量半导体制造实现快速、准确的分析 - 白皮书
视频 +
- Arsenic shallow implant monitoring with AKONIS
  
  The AKONIS automated SIMS tool outperforms other analytical systems for dose uniformity control at customer site. In this video, the tool measured 1.2% non-uniformity on arsenic shallow implants over full wafers.
- SiP metrology for logic n-mos production with AKONIS SIMS tool
  
  Thanks to its unique single detector technology, AKONIS performs long-term stability monitoring of shallow phosphorus implants in silicon.
- SPC of Logic p-mos with AKONIS SIMS tool
  
  Thanks to a proven single detector technology, the AKONIS automated SIMS tool ensures unequalled long-term stability Boron in SiGe monitoring at customer site.
- AKONIS, SIMS Excellence brought to the fab.
  
  A fully automated semiconductor metrology tool enabling implant dose monitoring in advanced logic chips, control of doping levels in the transistor source & drain, compositional analysis within 20 µm test pads on patterned silicon wafers, and more!