You are welcome to send us any missing references, pdf and supplements!
Please email cameca.info@ametek.com.
Oxygen out-diffusion and compositional changes in zinc oxide during ytterbium ions bombardment. Paweł Piotr Michałowski Jarosław Gaca Marek Wójcik Andrzej Turos. Nanotechnology 29, 425710 (2018)
http://iopscience.iop.org/article/10.1088/1361-6528/aad881
Thermally activated double-carrier transport in epitaxial graphene on vanadium-compensated 6H-SiC as revealed by Hall effect measurements. Tymoteusz Ciuk, Andrzej Kozlowski, Paweł Piotr Michałowski, Wawrzyniec Kaszub, Michal Kozubal, Zbigniew Rekuc, Jaroslaw Podgorski, Beata Stanczyk, Krystyna Przyborowska, Iwona Jozwik, Andrzej Kowalik, Pawel Kaminski. Carbon 139, 776-781 (2018)
https://www.sciencedirect.com/science/article/pii/S0008622318306973
The role of hydrogen in carbon incorporation and surface roughness of MOCVD-grown thin boron nitride. Piotr A. Caban, Dominika Teklinska, Paweł P. Michałowski, Jaroslaw Gaca, Marek Wojcik, Justyna Grzonka, Pawel Ciepielewski, Malgorzata Mozdzonek, Jacek M. Baranowski. Journal of Crystal Growth 498, 71-76 (2018)
https://www.sciencedirect.com/science/article/pii/S0022024818302756
Oxygen-induced high diffusion rate of magnesium dopants in GaN/AlGaN based UV LED heterostructures. Paweł Piotr Michałowski, Sebastian Złotnik, Jakub Sitek, Krzysztof Rosińskia and Mariusz Rudzińskia. Physical Chemistry Chemical Physics 20, 13890-13895 (2018)
http://pubs.rsc.org/en/Content/ArticleLanding/2018/CP/C8CP01470A
Self-organized multi-layered graphene–boron-doped diamond hybrid nanowalls for high-performance electron emission devices. Kamatchi Jothiramalingam Sankaran, Mateusz Ficek, Srinivasu Kunuku, Kalpataru Panda, Chien-Jui Yeh, Jeong Young Park, Miroslaw Sawczak, Paweł Piotr Michałowski, Keh-Chyang Leou, Robert Bogdanowicz, I-Nan Lin and Ken Haenen. Nanoscale 10, 1345-1355 (2018)
http://pubs.rsc.org/en/content/articlelanding/2018/nr/c7nr06774g
Formation of a highly doped ultra-thin amorphous carbon layer by ion bombardment of Graphene. Paweł Piotr Michałowski, Iwona Pasternak, Paweł Ciepielewski, Francisco Guinea and Włodek Strupiński. Nanotechnology 29, 305302 (2018)
http://iopscience.iop.org/article/10.1088/1361-6528/aac307
Contamination-free Ge-based graphene as revealed by graphene enhanced secondary ion mass spectrometry (GESIMS). Paweł Piotr Michałowski, Iwona Pasternak and Włodek Strupiński. Nanotechnology 29, 015702 (2018).
http://iopscience.iop.org/article/10.1088/1361-6528/aa98ed
Influence of hydrogen intercalation on graphene/Ge(0 0 1)/Si(0 0 1) interface. Justyna Grzonka, Iw ona Pasternak, Paweł Piotr Michałowski, Valery Kolkovsky and Włodek Strupiński. Applied Surface Science 447, 582-586 (2018).
https://www.sciencedirect.com/science/article/pii/S0169433218309838
Characterization of the superlattice region of a quantum cascade laser by secondary ion mass spectrometry. Paweł Piotr Michałowski, Piotr Gutowski, Dorota Pierścińska, Kamil Pierściński, Maciej Bugajski and Włodek Strupińskiac. Nanoscale 9, 17571-17575 (2017).
http://pubs.rsc.org/en/Content/ArticleLanding/2017/NR/C7NR06401B
Graphene Enhanced Secondary Ion Mass Spectrometry (GESIMS). Paweł Piotr Michałowski, Wawrzyniec Kaszub, Iwona Pasternak and Włodek Strupiński. Scientific Reports 7, 7479 (2017).
https://www.nature.com/articles/s41598-017-07984-1
Reproducibility of implanted dosage measurement with CAMECA Wf. Kian Kok Ong, Yun Wang and Zhiqiang Mo. IEEE 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits (2017).
DOI: 10.1109/IPFA.2017.8060158
Investigation of Cs+ bombardment effects in ultra-thin oxynitride gate dielectrics characterization by DSIMS. Yun Wang, Kian Kok Ong, Zhi Qiang Mo, Han Wei Teo, Si Ping Zhao. IEEE 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits (2017).
DOI: 10.1109/IPFA.2017.8060216
Secondary ion mass spectroscopy depth profiling of hydrogen-intercalated graphene on SiC. Pawel Piotr Michalowski, Wawrzyniec Kaszub, Alexandre Merkulov and Wlodek Strupinski. Appl. Phys. Lett. 109, 011904 (2016).
http://scitation.aip.org/content/aip/journal/apl/109/1/10.1063/1.4958144
SIMS depth profiling and topography studies of repetitive III–V trenches under low energy oxygen ion beam sputtering. Viktoriia Gorbenko, Franck Bassani, Alexandre Merkulov, Thierry Baron, Mickael Martin, Sylvain David and Jean-Paul Barnes. J. Vac. Sci. Technol. B 34, 03H131 (2016).
http://dx.doi.org/10.1116/1.4944632
Kr implantation into heavy ion irradiated monolithic UeMo/Al systems: SIMS and SEM investigations. T. Zweifel, N. Valle, C. Grygiel, I. Monnet, L. Beck, W. Petry (2016), Journal of Nuclear Materials, Volume 470, Pages 251-257. doi:10.1016/j.jnucmat.2015.12.039.
Ion beam characterizations of plasma immersion ion implants for advanced nanoelectronic applications. M. Veillerot, F. Mazen, N. Payen, J.P. Barnes, F. Pierre (2014), SIMS Europe 2014, September 7-9, 2014.
Characterization of arsenic PIII implants in FinFETs by LEXES, SIMS and STEM-EDX. Kim-Anh Bui-Thi Meura, Frank Torregrosa, Anne-Sophie Robbes, Seoyoun Choi, Alexandre Merkulov, Mona P. Moret, Julian Duchaine, Naoto Horiguchi, Letian Li, Christoph Mitterbauer (2014), 20th International Conference on Ion Implantation Technology (IIT), 2014. DOI: 10.1109/IIT.2014.6940011.
Cesium/Xenon dual beam sputtering in a Cameca instrument. R. Pureti, B.Douhard, D.Joris, A.Merkulov and W.Vandervorst. Surface and Interface Analysis. Volume 46, Issue S1, pages 25–30, November 2014
Si- useful yields measured in Si, SiC, Si3N4 and SiO2: comparison between the Strong Matter technique and SIMS. B.Kasel and T.Wirtz. Surface and Interface Analysis. Volume 46, Issue S1, pages 39–42, November 2014
Unravelling the secrets of Cs controlled secondary ion formation: Evidence of the dominance of site specific surface chemistry, alloying and ionic bonding. K. Wittmaack. Surface Science Reports. Volumn 68, Issue 1, pages 108–230, 1 March 2013
The secondary ions emission from Si under low-energy Cs bombardment in a presence of oxygen. A. Merkulov. Surface and Interface Analysis. Volume 45, Issue 1, pages 90–92, January 2013
Application of extra-low impact energy SIMS and data reduction algorithm to USJ profiling. D. Kouzminov, A. Merkulov, E. Arevalo, H.-J. Grossmann. Surface and Interface Analysis. Volume 45, Issue 1, pages 345–347, January 2013
Application of extra-low impact energy SIMS and data reduction algorithm to USJ profiling. D. Kouzminov, A. Merkulov, E. Arevalo, H.-J. Grossmann. Surf. and Interface Analysis, 5 Aug 2012, DOI: 10.1002/sia.5138.
The secondary ions emission from Si under low-energy Cs bombardment in a presence of oxygen. A. Merkulov. Surf. and Interface Analysis, 5 Aug 2012, DOI: 10.1002/sia.5132
Experimental studies of dose retention and activation in fin field-effect-transistor-based structures. Jay Mody, Ray Duffy, Pierre Eyben, Jozefien Goossens, Alain Moussa, Wouter Polspoel, Bart Berghmans, M. J. H. van Dal, B. J. Pawlak, M. Kaiser, R. G. R. Weemaes, and Wilfried Vandervorst (2010), Journal of Vacuum Science & Technology B, Volume 28, Issue 1. C1H5. doi: 10.1116/1.3269755.
Sputtering behavior and evolution of depth resolution upon low energy ion irradiation of GaAs. M.J.P. Hopstaken, M.S. Gordon, D. Pfeiffer, D.K. Sadana, T. Topuria, P.M. Rice, C. Gerl, M. Richter, C. Marchiori. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. Volume 28, Issue 6, 1287, 18 November 2010
Advanced SIMS quantification in the first few nm of B, P, and As Ultra Shallow Implants. A.Merkulov, P.Peres, J.Choi, F.Horreard, H-U.Ehrke, N. Loibl, M.Schuhmacher, Journal of Vacuum Science & Technology B. 28, C1C48 (2010) ; doi:10.1116/1.3225588
Chemical Erosion and Transport: Transport and Deposition of First Wall Impurities. Francesco Ghezzi (2009), CONSIGLIO NAZIONALE DELLE RICERCHE. TASK PWI-08-TA-06.
Long-term Reproducibility of Relative Sensitivity Factors Obtained with CAMECA Wf. D. Gui, ZX Xing, YH Huang, ZQ Mo, YN Hua, SP Zhao, LZ Cha. Applied Surface Science, Volume 255, Issue 4, Pages 1427–1429 (2008)
EXLE-SIMS: Dramatically Enhanced Accuracy for Dose Loss Metrology. W.Vandervorst, R.Vos, A.J.Salima, A.Merkulov, K. Nakajimac and K.Kimura. Proceedings of the 17th International Conference on Ion Implentation Technology, IIT 2008, Monterey, CA, USA. AIP Conf. Proc. Vol. 1066 (2008), 109-112
Semiconductor profiling with sub-nm resolution: challenges and solutions. W.Vandervorst, App. Surf. Science 255 (2008) 805
Roughness development in the depth profiling with 500eV O2 beam with the combination of oxygen flooding and sample rotation. D. Gui, Z.X.Xing, Y.H.Huang, Z.Q.Mo, Y.N.Hua, S.P.Zhao and L.Z.Cha, App. Surf. Science 255 (2008) 1433
Depth profiling of ultra-thin oxynitride date dielectrics by using MCs2+ technique. D.Gui, Z.X.Xing, Y.H.Huang, Z.Q.Mo, Y.N.Hua, S.P.Zhao and L.Z.Cha (2008), App. Surf. Science, Volume 255, Issue 4, Pages 1437-1439. doi:10.1016/j.apsusc.2008.06.047.
Impurity measurement in silicon with D-SIMS and atom probe tomography. P.Ronsheim, App. Surf. Science 255 (2008) 1547.
SIMS depth profiling of boron ultra shallow junctions using oblique O2 beam down to 150eV. M.Juhel, F.Laugier, D.Delille,C.Wyon, L.F.T.Kwakman and M.Hopstaken, App. Surf. Science 252 (2006), 7211
Boron ultra low energy SIMS depth profiling improved by rotating stage. M.Bersani, D.Guibertoni, at al, App. Surf. Science 252 (2006) 7315
Comparison between SIMS and MEIS techniques for the characterization of ultra shallow arsenic implants. M.Bersani, D.Guibertoni, et al, App. Surf. Science 252 (2006) 7214
SIMS Depth Profiling of SiGe:C structures in test pattern areas using low energy Cs with a Cameca Wf , M.Juhel, F. Laugier, App. Surf. Science 231-232 (2004) 698
Sputtered depth scales of multi-layered samples with in situ laser interferometry: arsenic diffusion in Si/SiGe layers. P.A.Ronsheim, R.Loesing and A.Mada, App. Surf. Science 231-232 (2004) 762
Short-term and long-term RSF repeatability for CAMECA SC Ultra SIMS measurements. M. Barozzi, D. Giubertoni, M. Anderle and M. Bersani. App. Surf. Science 231-232 (2004) 768-771
Toward accurate in-depth profiling of As and P ultra-shallow implants by SIMS. A. Merkulov, E. de Chambost, M. Schuhmacher and P. Peres. Oral presentation at SIMS XIV, San Diego, USA, Sep. 2003. Applied Surface Science 231–232 (2004) 640–644
Accurate on-line depth calibration with laser interferometer during SIMS profiling experiment on the CAMECA IMS Wf instrument. O. Merkulova, A. Merkulov, M. Schuhmacher, and E. de Chambost. SIMS XIV, San Diego, USA, Sep. 2003. Applied Surface Science 231–232 (2004) 954–958
Latest developments for the CAMECA ULE-SIMS instruments: IMS Wf and SC Ultra. E. de Chambost, A. Merkulov, P. Peres, B. Rasser, M. Schuhmacher. Poster for SIMS XIV, San Diego, USA, Sept 2003. Applied Surface Science 231–232 (2004) 949–953