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Arsenic shallow implant monitoring with AKONIS SIMS

星期四, 五月 4, 2023

The AKONIS automated SIMS tool outperforms other analytical systems for dose uniformity control
at customer site, detecting down to 1% non-uniformity over full wafers! As an example, the tool measured 1.2% non-uniformity on arsenic shallow implants. Automatically provided through real-time mapping, such metrics are essential for maximizing production yields of advanced-node logic n-mos and other complex semiconductor devices!

Watch our new video for full details!