The AKONIS automated SIMS tool outperforms other analytical systems for dose uniformity control
at customer site, detecting down to 1% non-uniformity over full wafers! As an example, the tool measured 1.2% non-uniformity on arsenic shallow implants. Automatically provided through real-time mapping, such metrics are essential for maximizing production yields of advanced-node logic n-mos and other complex semiconductor devices!
Watch our new video for full details!